AVS 72nd International Symposium & Exhibition
Materials Science and Physics symposium
Starts in 28 days
About
The AVS symposium connects atomic-scale processing, characterisation, measurement and simulation with the behaviour of materials, surfaces, interfaces and devices. Its programme spans thin films, plasma processes, microelectronics, quantum technologies, two-dimensional materials, biomaterials and vacuum engineering.
It links fundamental investigations with manufacturing, including semiconductor scaling, heterogeneous integration, autonomous experimentation and more resource-efficient production. Technical talks, posters, tutorials and an equipment exhibition support exchange between academic, industrial and government researchers.
All programme times are America/New_York (EST, UTC−5). Sunday technical sessions run 15:00–19:00 on 8 November. The Monday plenary is 08:30–10:00; Tuesday–Thursday morning sessions start at 08:00, and Friday sessions run 08:15–12:00. Attendance is in person. Current full-week fees are USD 915 for Platinum members and USD 1,265 for non-members; student rates are USD 310 and USD 465. Day registration is also available; tutorials require an additional fee. Online registration remains available throughout the meeting, with badge collection at the venue.
Topics
- thin films
- atomic-scale processing
People
Akihisa Sekiguchi
Tokyo Electron America, Inc.
Angélique Raley
Tokyo Electron America, Inc.
Mark Losego
Georgia Tech