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Seminar, Hosted by micro resist technology

From Grayscale Lithography to Wafer-Level Optics: Scalable Manufacturing of Advanced Micro-Optics

Robert Leitel and Barbara Seise

Fraunhofer IOF

Abstract

Explore fabrication methods for micro-optical components, including grayscale lithography, wafer-level replication and UV nanoimprint processes. The presentation examines transparent-polymer replication, cycle times and wafer-scale integration, then considers apertures and spacers for compact optical assemblies. Applications include automotive lighting, three-dimensional sensing, hyperspectral imaging and telecommunications.

Topics